1-20 of 22 Search Results for

photoresists

Follow your search
Access your saved searches in your account

Would you like to receive an alert when new items match your search?
Close Modal
Sort by
Series: ASM Handbook
Volume: 13C
Publisher: ASM International
Published: 01 January 2006
DOI: 10.31399/asm.hb.v13c.a0004171
EISBN: 978-1-62708-184-9
... and boat fixtures. (b) Diagram of etcher-system components. (c) SEM image of a metal-etch feature Metal Lead Etch in Batch Etchers Batch etchers ( Fig. 5 ) are identified as 8330 on the fabrication unit layout ( Fig. 3 ). Corrosion is due to: Presence of photoresist remaining after...
Book: Machining
Series: ASM Handbook
Volume: 16
Publisher: ASM International
Published: 01 January 1989
DOI: 10.31399/asm.hb.v16.a0002171
EISBN: 978-1-62708-188-7
... Abstract Photochemical machining (PCM), also known as chemical blanking, is a metal-etching process that uses a photoresist to define the locations where the metal will be etched. This article describes the major steps used in the PCM process, namely, the preparation of the phototool, selection...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001285
EISBN: 978-1-62708-170-2
... fabrication, the surface needs to be planarized at some point before the next processing step. One method involves depositing the PECVD oxide film over the processed wafer, followed by deposition and flow of photoresist. The photoresist and the oxide films are then dry etched. The etch rate of the PECVD oxide...
Series: ASM Handbook
Volume: 23A
Publisher: ASM International
Published: 12 September 2022
DOI: 10.31399/asm.hb.v23A.a0006862
EISBN: 978-1-62708-392-8
... within the focal region; the femtosecond laser beam is focused into the photoresist on a glass cover slip to fabricate high-resolution 3D structures within the photoresist ( Ref 156 ). The photoresists comprise negative-tone and positive-tone photoresists ( Ref 157 ); two-photon absorption (TPA) results...
Series: ASM Desk Editions
Publisher: ASM International
Published: 01 December 1998
DOI: 10.31399/asm.hb.mhde2.a0003194
EISBN: 978-1-62708-199-3
... parameters and typical values Masking with tapes or paints common in chemical milling. Printing using photoresists common in chemical blanking. Etchant (function of metal and often proprietary): For aluminum, solutions of sodium hydroxide. For steel, solutions of hydrochloric plus nitric acids. For copper...
Series: ASM Handbook
Volume: 24
Publisher: ASM International
Published: 15 June 2020
DOI: 10.31399/asm.hb.v24.a0006565
EISBN: 978-1-62708-290-7
... conidia ) using a 50 nm thick silver DRL ( Ref 32 ). A schematic illustrating the bubble formation during DRL-mediated LIFT is shown in Fig. 6(b) . Use of metallic DRLs or highly absorbing polymer-based materials (i.e., photoresists and other easily vaporized polymers such as aryltriazene) enables...
Series: ASM Handbook
Volume: 13C
Publisher: ASM International
Published: 01 January 2006
DOI: 10.31399/asm.hb.v13c.a0004170
EISBN: 978-1-62708-184-9
... proprietary processes. Residual chemicals from processes can introduce significant amounts of ionic contaminants. Solder fluxes, plating, and various etching processes may leave residual chemicals on the surfaces of metals or sidewalls of patterned photoresist. Microelectronic devices are particularly...
Series: ASM Handbook
Volume: 8
Publisher: ASM International
Published: 01 January 2000
DOI: 10.31399/asm.hb.v08.a0003304
EISBN: 978-1-62708-176-4
... by a thin lubricant layer (which is a thin film of minimal shearing resistance and very high bulk modulus) are used along with the backing plate to capture the longitudinal and shear momenta. A liquid lubricant was used by Machcha and Nemat-Nasser ( Ref 16 ), while a solid lubricant (photoresist AZ 1350J...
Series: ASM Handbook
Volume: 2
Publisher: ASM International
Published: 01 January 1990
DOI: 10.31399/asm.hb.v02.a0001091
EISBN: 978-1-62708-162-7
... active. Areas of the chip that are to remain semiinsulating are covered with a photoresist mask before ion implantation. The process of ion implantation may be repeated several times with different metals on different areas of the chip, depending on the type and complexity of the device being...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001265
EISBN: 978-1-62708-170-2
... either electrolytic copper or full-build additive copper (20 to 35 μmm). Imaging of three-dimensional substrates has necessitated development of inventive materials and processes ( Ref 41 ). Electrodeposited photoresists, as well as novel methods of exposure and related equipment, have proven key...
Series: ASM Handbook
Volume: 23A
Publisher: ASM International
Published: 12 September 2022
DOI: 10.31399/asm.hb.v23A.a0006902
EISBN: 978-1-62708-392-8
Series: ASM Desk Editions
Publisher: ASM International
Published: 01 November 1995
DOI: 10.31399/asm.hb.emde.a0003067
EISBN: 978-1-62708-200-6
Series: ASM Handbook
Volume: 2A
Publisher: ASM International
Published: 30 November 2018
DOI: 10.31399/asm.hb.v02a.a0006494
EISBN: 978-1-62708-207-5
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.9781627081702
EISBN: 978-1-62708-170-2
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0005585
EISBN: 978-1-62708-170-2
Series: ASM Handbook
Volume: 10
Publisher: ASM International
Published: 15 December 2019
DOI: 10.31399/asm.hb.v10.a0006670
EISBN: 978-1-62708-213-6
Book: Machining
Series: ASM Handbook
Volume: 16
Publisher: ASM International
Published: 01 January 1989
DOI: 10.31399/asm.hb.v16.a0002184
EISBN: 978-1-62708-188-7
Book Chapter

Series: ASM Desk Editions
Publisher: ASM International
Published: 01 November 1995
DOI: 10.31399/asm.hb.emde.a0003065
EISBN: 978-1-62708-200-6
Series: ASM Handbook
Volume: 10
Publisher: ASM International
Published: 15 December 2019
DOI: 10.31399/asm.hb.v10.a0006677
EISBN: 978-1-62708-213-6
Series: ASM Desk Editions
Publisher: ASM International
Published: 01 November 1995
DOI: 10.31399/asm.hb.emde.9781627082006
EISBN: 978-1-62708-200-6