This article describes the vapor-phase growth techniques applied to the epitaxial deposition of semiconductor films and discusses the fundamental processes involved in metal-organic chemical vapor deposition (MOCVD). It reviews the thermodynamics that determine the driving force behind the overall growth process and the kinetics that define the rates at which the various processes occur. The article provides information on the reactor systems and hardware, MOCVD starting materials, engineering considerations that optimize growth, and the growth parameters for a variety of Group III-V, II-VI, and IV semiconductors.

This article presents the principles of chemical vapor deposition (CVD) with illustrations. It discusses the types of CVD processes, namely, thermal CVD, plasma CVD, laser CVD, closed-reactor CVD, chemical vapor infiltration, and metal-organic CVD. The article reviews the CVD reactions of materials related to hard, tribological, and high-temperature coatings and to free-standing structures. It concludes by reviewing the advantages, disadvantages, and applications of CVD.

This article discusses the application of amorphous and crystalline films through plasma-enhanced chemical vapor deposition (PECVD) from the view point of microelectronic device fabrication. It describes the various types of PECVD reactors and deposition techniques. Plasma enhancement of the CVD process is discussed briefly. The article also describes the properties of amorphous and crystalline films deposited by the PECVD process for integrated circuit fabrication.

This article provides information on the liquid lithium systems that are exposed to liquid metal. It discusses the forms in which liquid-metal corrosion is manifested. The influence of several key factors on the corrosion of metals and alloys by liquid-metal systems or liquid-vapor metal coolants is described. Some information on safety precautions for handling liquid metals, operating circulating systems, dealing with fire and spillage, and cleaning contaminated components, are also provided.

Supercritical water oxidation (SCWO) is an effective process for the destruction of military and industrial wastes including wastewater sludge. This article discusses the unique properties of supercritical water and lists the main technological advantages of SCWO. For many waste streams, corrosion continues to be one of the central challenges to the full development of the SCWO technology. The article presents a summary of selected materials exposed to various environments as well as the observed form of corrosion in a table. It also illustrates the necessity to adopt a synergistic approach incorporating feed chemistry control, reactor design modifications, and intelligent materials selection, for mitigating degradation of SCWO systems.

This article describes the eight chemical cleaning methods, namely, circulation, fill and soak, cascade, foam, vapor-phase organic, steam-injected, on-line chemical, and mechanical cleaning. It presents information on deposit types, solvents used to remove them, and construction material incompatibilities in a table. The article summarizes the uses of chemical cleaning solutions, including hydrochloric acid, phosphoric acid, and sulfamic acid, as well as the additives used to neutralize their impact on corrosion. It discusses the chemical cleaning procedures, including selection of cleaning method and solvent, documentation of cleaning, and corrosion monitoring in chemical cleaning.

This article focuses on transport phenomena and modeling approaches that are specific to vapor-phase processes (VPP). It discusses the VPP for the synthesis of materials. The article reviews the basic notions of molecular collisions and gas flows, and presents transport equations. It describes the modeling of vapor-surface interactions and kinetics of hetereogeneous processes as well as the modeling and kinetics of homogenous reactions in chemical vapor deposition (CVD). The article provides information on the various stages of developing models for numerical simulation of the transport phenomena in continuous media and transition regime flows of VPP. It explains the methods used for molecular modeling in computational materials science. The article also presents examples that illustrate multiscale simulations of CVD or PVD processes and examples that focus on sputtering deposition and reactive or ion beam etching.

This article provides an overview of plasma surface treatments for plastics. It covers the equipment and methods used in plasma processing, providing detailed explanations of the plasma discharge reactions and how they affect surface state and topography. It also provides information on contamination removal, plasma surface modification, plasma-induced grafting, and plasma film deposition.

This article provides information on the municipal wastewater system components such as piping, pump stations, headworks, clarifiers, aeration structures, digesters, biosolids dewatering equipment, and sludge stabilization. It explains the major corrosion damage mechanisms to which those component parts of the system are exposed. It presents useful guidelines for selecting and using protective coatings in municipal sewerage collection systems and water reclamation facilities in wastewater treatment plants. The article includes annotated flow diagrams of a wastewater collection system, wastewater treatment plants, and spreadsheets listing the most widely used generic coating systems by structure and substrate material. It concludes with a section on quality watchouts when selecting or using protective coatings in municipal wastewater systems.

This article discusses the materials of construction found in pharmaceutical production facilities. The materials discussed are different stainless steels, nickel and nickel-base alloys, titanium, zirconium, impervious graphite, fluoropolymers, and glass-lined steel. The article describes the three primary causes of failure in the manufacture of pharmaceuticals: embedded iron, failures of glass linings, and corrosion under thermal insulation.

This article describes the four major conditions that can cause beryllium to corrode in air. These include beryllium carbide particles exposed at the surface; surface contaminated with halide, sulfate, or nitrate ions; surface contaminated with other electrolyte fluids; and atmosphere that contains halide, sulfate, or nitrate ions. The article provides information on the behavior of beryllium under the combined effects of high-purity water environment, stress and chemical environment, and high-temperature environment. The compositions of the structural grades for intentionally controlled elements and major impurities are tabulated. The article discusses the in-process problems and procedures that are common but avoidable when processing beryllium and aluminum-beryllium composites. It also describes the types of coatings used on beryllium and aluminum-beryllium. These include chemical conversion coatings, anodized coatings, plated coatings, organic coatings, and plasma-sprayed coatings.

Ceramic-matrix composites (CMCs) have ability to withstand high temperatures and have superior damage tolerance over monolithic ceramics. This article describes important processing techniques for CMCs: cold pressing, sintering, hot pressing, reaction-bonding, directed oxidation, in situ chemical reaction techniques, sol-gel techniques, pyrolysis, polymer infiltration, self-propagating high-temperature synthesis, and electrophoretic deposition. The advantages and disadvantages of each technique are highlighted to provide a comprehensive understanding of the achievements and challenges that remain in this area.

This article focuses on the mineral and organic acid cleaning of iron and steel. It begins with a discussion on the application methods, process selection criteria, solution composition, equipment used, and control of process variables in mineral acid cleaning. The article then describes the advantages and disadvantages of organic acid cleaning. Applications, including boiler cleaning, stainless steel cleaning, and removal of iron- and copper-bearing deposits, are discussed. The article concludes with an overview of acid cleaning of nonferrous alloys.

This article presents the primary considerations and mechanisms for corrosion and explains how they are involved in the selection of materials for process equipment in refineries and petrochemical plants. It discusses the material selection criteria for a number of ferrous and nonferrous alloys used in petroleum refining and petrochemical applications. The article reviews the mechanical properties, fabricability, and corrosion resistance of refinery steels. It describes low- and high-temperature corrosion, hydrogen embrittlement, and cracking such as stress-corrosion, sulfide stress, and stress-oriented hydrogen-induced cracking. The article considers hydrogen attack, corrosion fatigue, and liquid metal embrittlement and the methods of combating them. It explains the causes of velocity-accelerated corrosion and erosion-corrosion. The article summarizes some corrective measures that can be implemented to control corrosion. The applicable standards for materials used in corrosive service conditions in upstream and downstream petroleum service are presented in a tabular form.

Ores, which consist of the primary valuable mineral, predominant gangue content, valuable by-products, and detrimental impurities, are extracted and directed to mineral processing. This article describes the mineral processing facilities, such as crushers, grinders, concentrators, separators, and flotation devices that are used for particle size reduction, separation of particles according to their settling rates in fluids and dewatering of concentrate particles. It explains the basic principles, flow diagrams, ore concentrate preparation methods, and equipment of major types of metallurgical processes, including pyrometallurgical, hydrometallurgical, and electrometallurgical processes.

Gallium-base components can be found in a variety of products ranging from compact disk players to advanced military electronic warfare systems, owing to the factor that it can emit light, has a greater resistance to radiation and operates at faster speeds and higher temperatures. This article discusses the uses of gallium in optoelectronic devices and integrated circuits and applications of gallium. The article discusses the properties and grades of gallium arsenide and also provides information on resources of gallium. The article talks about the recovery techniques, including recovery from bauxite, zinc ore and secondary recovery process and purification. The article briefly describes the fabrication process of gallium arsenide crystals. Furthermore, the article gives a short note on world supply and demand of gallium and concludes with research and development on gallium arsenide integrated circuits.

Carbon-carbon is a unique composite material in which a nonstructural carbonaceous matrix is reinforced by carbon fibers to create a heat-resistant structural material that finds application in the aerospace and defense industries. This article provides a detailed account of the fundamentals of protecting carbon-carbon composites and explains the various coating deposition techniques, namely, pack cementation, chemical vapor deposition, and slurry coatings. It includes information on the practical limitations of coatings for the carbon-carbon composites.