Gas analysis by mass spectrometry, or gas mass spectrometry, is a general technique using a family of instrumentation that creates a charged ion from a gas phase chemical species and measures the mass-to-charge ratio. This article covers gas analysis applications that do not use chromatographic separation to physically isolate components of the sample prior to analysis. It is intended to provide an understanding of gas analysis instrumentation and terminology that will help make informed decisions in choosing an instrument and methodology appropriate for the data needed. Mass-analyzer technologies for gas mass spectrometry, namely quadrupole mass filters, magnetic sector mass filters, and time-of-flight mass analyzers are covered. Common factors to consider in choosing an analyzer for static or continuous gas measurement are also described. In addition, the article presents some examples of applications of gas mass spectrometry.

Gas analysis by mass spectrometry, or gas mass spectrometry, is a useful analytical tool for investigations performed in controlled atmospheres or in vacuum. This article provides sufficient information to determine if gas mass spectrometry can produce the data required and to determine the type of instrument necessary for a particular application. It discusses the working operations of gas mass spectrometer components, namely, the introduction system, ion sources, mass analyzers, and the ion detector. The article also provides information on resolution of a gas mass spectrometer determined by the width of the source slit and the collector slit. Finally, it describes the instrument set-up for gas mass spectrometry, and shows how to analyze the test results of gas mass spectrometry.

This article discusses the basic principles of inductively coupled plasma mass spectrometry (ICP-MS), covering different instruments used for performing ICP-MS analysis. The instruments covered include the sample-introduction system, ICP ion source, mass analyzer, and ion detector. Emphasis is placed on ICP-MS applications in the semiconductor, photovoltaic, materials science, and other electronics and high-technology areas.

This article briefly describes the capabilities of gas chromatography/mass spectrometry, which is used to qualitatively and quantitatively determine organic (and some inorganic) compound purity and stability and to identify components in a mixture. The discussion covers in more detail gas chromatography/mass spectrometry (GC/MS) instrumentation, interpreting mass spectra, GC/MS methodology, and GC/MS advances. Sample preparation, which is very important in GC/MS to avoid erroneous data and to minimize maintenance and troubleshooting of the instrument, is also discussed. Further, the article highlights the state of the art in the MS detector technology.

Gas chromatography/mass spectrometry (GC/MS) is useful in analyzing mixtures of organic compounds. This article commences with a description of the principles of mass spectrometry and gas chromatography. It provides information on the procedures of mass spectrum interpretation, and describes the experimental procedure of and sample preparation for GC/MS. The article also discusses complementary techniques, such as high-performance liquid chromatography/mass spectrometry and mass spectrometry/mass spectrometry, and concludes with the applications of GC/MS.

This article provides a brief account of glow discharge mass spectrometry (GDMS) for direct determination of trace elements in solid samples and for fast depth profiling in a great variety of innovative materials. It begins by describing the general principles of GDMS. This is followed by a discussion on the various components of a GDMS system as well as commercial GDMS instruments. A description of processes involved in specimen preparation and cleaning in GDMS is then presented. Various problems pertinent to multielemental calibrations in GDMS are discussed along with measures to overcome them. The article further provides information on the processes involved in the analytical setup of parameters in GDMS, covering the steps involved in the analysis of GDMS data. It ends with a section on the application and interpretation of GDMS in the metals industry.

This article endeavors to familiarize the reader with a selection of different ionization designs and instrument components to provide knowledge for sorting the various analytical strategies in the field of solid analysis by mass spectrometry (MS). It begins with a description of the general principles of MS. This is followed by sections providing a basic understanding of instrumentation and discussing the operating requirements as well as practical considerations related to solid sample analysis by MS. Instrumentation discussed include the triple quadrupole mass spectrometer and the time-of-flight mass spectrometer. Inductively coupled plasma and thermal ionization MS provide atomic information, and direct analysis in real-time and matrix-assisted laser-desorption ionization MS are used to analyze molecular compositions. The article describes various factors pertinent to ionization methods, namely glow discharge mass spectrometry and secondary ion mass spectrometry. It concludes with a section on various examples of applications and interpretation of MS for various materials.

This article covers the three most popular techniques used to characterize the very outermost layers of solid surfaces: Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), and time-of-flight secondary ion mass spectrometry (TOF-SIMS). Some of the more important attributes are listed for preliminary insight into the strengths and limitations of these techniques for chemical characterization of surfaces. The article describes the basic theory behind each of the different techniques, the types of data produced from each, and some typical applications. Also discussed are the different types of samples that can be analyzed and the special sample-handling procedures that must be implemented when preparing to do failure analysis using these surface-sensitive techniques. Data obtained from different material defects are presented for each of the techniques. The examples presented highlight the typical data sets and strengths of each technique.