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ion beam etching
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Series: ASM Handbook
Volume: 22A
Publisher: ASM International
Published: 01 December 2009
DOI: 10.31399/asm.hb.v22a.a0005434
EISBN: 978-1-62708-196-2
... and reactive or ion beam etching. vapor-phase process vapor-surface interaction hetereogeneous process homogenous reaction chemical vapor deposition numerical simulation molecular modeling multiscale simulation sputtering deposition ion beam etching VAPOR-PHASE PROCESSES (VPP) involve...
Abstract
This article focuses on transport phenomena and modeling approaches that are specific to vapor-phase processes (VPP). It discusses the VPP for the synthesis of materials. The article reviews the basic notions of molecular collisions and gas flows, and presents transport equations. It describes the modeling of vapor-surface interactions and kinetics of hetereogeneous processes as well as the modeling and kinetics of homogenous reactions in chemical vapor deposition (CVD). The article provides information on the various stages of developing models for numerical simulation of the transport phenomena in continuous media and transition regime flows of VPP. It explains the methods used for molecular modeling in computational materials science. The article also presents examples that illustrate multiscale simulations of CVD or PVD processes and examples that focus on sputtering deposition and reactive or ion beam etching.
Image
Published: 15 December 2019
Fig. 15 Diffraction patterns from oriented pyrolytic graphite. (a) Freshly cleaved sample. (b to d) Increasing surface damage caused by ion beam etching
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Image
Published: 01 January 1986
Fig. 15 Diffraction patterns from oriented pyrolytic graphite. (a) Freshly cleaved sample. (b to d) Increasing surface damage caused by ion beam etching
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Series: ASM Handbook Archive
Volume: 10
Publisher: ASM International
Published: 01 January 1986
DOI: 10.31399/asm.hb.v10.a0001769
EISBN: 978-1-62708-178-8
... for ion beam etching of the surface and for contact angle measurements in situ. The experiment consisted of ion beam etching the surface to make it atomically rough, observing the changes in the diffraction pattern, and correlating the changes in contact angle to the LEED results. Figure 15 shows...
Abstract
Low-energy electron diffraction (LEED) is a technique for investigating the crystallography of surfaces and overlayers adsorbed on surfaces. This article describes the principles of diffraction from surfaces, and elucidates the method of sample preparation to achieve diffraction patterns. The article describes the limitations of surface sensitive electron diffraction and discusses the applications of LEED with examples.
Series: ASM Handbook
Volume: 10
Publisher: ASM International
Published: 15 December 2019
DOI: 10.31399/asm.hb.v10.a0006655
EISBN: 978-1-62708-213-6
... to determine that the sample surface was clean. The vacuum chamber also has capabilities for ion beam etching of the surface and for contact angle measurements in situ. The experiment consisted of ion beam etching the surface to make it atomically rough, observing the changes in the diffraction pattern...
Abstract
Low-energy electron diffraction (LEED) is a technique for investigating the crystallography of surfaces and overlayers adsorbed on surfaces. This article provides a brief account of LEED, covering the principles and measurements of diffraction from surfaces. Some of the processes involved in sample preparation are described. In addition, the article discusses the limitations of surface-sensitive electron diffraction and the applications of LEED with examples.
Series: ASM Handbook
Volume: 10
Publisher: ASM International
Published: 15 December 2019
DOI: 10.31399/asm.hb.v10.a0006677
EISBN: 978-1-62708-213-6
... Abstract This article is intended to provide the reader with a good understanding of the underlying science, technology, and the most common applications of focused ion beam (FIB) instruments. It begins with a survey of the various types of FIB instruments and their configurations, discusses...
Abstract
This article is intended to provide the reader with a good understanding of the underlying science, technology, and the most common applications of focused ion beam (FIB) instruments. It begins with a survey of the various types of FIB instruments and their configurations, discusses the essential components, and explains their function only to the extent that it helps the operator obtain the desired results. An explanation of how the components of ion optical column shape and steer the ion beam to the desired target locations is then provided. The article also reviews the many diverse accessories and options that enable the instrument to realize its full potential across all of the varied applications. This is followed by a detailed analysis of the physical processes associated with the ion beam interacting with the sample. Finally, a complete survey of the most prominent FIB applications is presented.
Image
Published: 15 December 2019
Fig. 23 Positive secondary ion mass spectroscopy (SIMS) depth profiles. (a) Various constituents. (b) Hydrogen in a calcium-boroaluminosilicate glass ribbon after acid etching 16 h in H 2 SO 4 . Acquired using Ar + primary ion bombardment in a scanning ion microprobe and an electron beam
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Image
Published: 01 January 1986
Fig. 20 Positive SIMS depth profiles. (a) Various constituents. (b) Hydrogen in a calcium-boroaluminosilicate glass ribbon after acid-etching 16 h in H 2 SO 4 . Obtained using Ar + primary ion bombardment in a scanning ion microprobe and an electron beam for charge neutralization
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Book: Surface Engineering
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001289
EISBN: 978-1-62708-170-2
... ). The bombarding species and the depositing species can be from a number of sources. Bombardment can take place in a plasma or vacuum environment. When a beam of energetic particles is used in vacuum, the process is often called ion-beam-assisted deposition (IBAD). A vacuum can be defined as an environment...
Abstract
This article begins with a list of the factors that influence the properties of physical vapor deposited films. It describes the steps involved in ion plating, namely, surface preparation, nucleation, interface formation, and film growth. The article discusses the factors influencing the properties of ion-plated films. The sources of potential applied on substrate surface, bombarding species, and depositing species are addressed. The article also provides information on the parameters that influence bombardment. It concludes with a discussion on the advantages, limitations, and applications of ion plating.
Image
Published: 31 October 2011
Fig. 13 Sealing patch on microelectromechanical systems-type peristaltic pump etch holes produced by focused ion beam deposition on silicon from a platinum-containing organometallic gas. Source: Ref 46
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Series: ASM Handbook Archive
Volume: 10
Publisher: ASM International
Published: 01 January 1986
DOI: 10.31399/asm.hb.v10.a0001774
EISBN: 978-1-62708-178-8
... Abstract In secondary ion mass spectroscopy (SIMS), an energetic beam of focused ions is directed at the sample surface in a high or ultrahigh vacuum (UHV) environment. The transfer of momentum from the impinging primary ions to the sample surface causes sputtering of surface atoms...
Abstract
In secondary ion mass spectroscopy (SIMS), an energetic beam of focused ions is directed at the sample surface in a high or ultrahigh vacuum (UHV) environment. The transfer of momentum from the impinging primary ions to the sample surface causes sputtering of surface atoms and molecules. This article focuses on the principles and applications of high sputter rate dynamic SIMS for depth profiling and bulk impurity analysis. It provides information on broad-beam instruments, ion microprobes, and ion microscopes, detailing their system components with illustrations. The article graphically illustrates the SIMS spectra and depth profiles of various materials. The quantitative analysis of ion-implantation profiles, instrumental features required for secondary ion imaging, the analysis of nonmetallic samples, detection sensitivity, and the applications of SIMS are also discussed.
Book: Fractography
Series: ASM Handbook
Volume: 12
Publisher: ASM International
Published: 01 June 2024
DOI: 10.31399/asm.hb.v12.a0006847
EISBN: 978-1-62708-387-4
... Abstract The introduction of focused ion beam (FIB) microscopy in the 1990s added the capability of studying fracture surfaces in the third dimension and making site-specific and stress-free transmission electron microscope (TEM) specimens in situ. This article reviews the methods for preparing...
Abstract
The introduction of focused ion beam (FIB) microscopy in the 1990s added the capability of studying fracture surfaces in the third dimension and making site-specific and stress-free transmission electron microscope (TEM) specimens in situ. This article reviews the methods for preparing replicas and the site-specific FIB thin-foil preparation technique. It provides an overview of FIB-TEM specimen preparation.
Book Chapter
Series: ASM Handbook
Volume: 10
Publisher: ASM International
Published: 15 December 2019
DOI: 10.31399/asm.hb.v10.a0006683
EISBN: 978-1-62708-213-6
... sensitivity of SIMS. It ends with a discussion on a variety of examples of SIMS applications. secondary ion mass spectroscopy Overview Introduction In secondary ion mass spectroscopy (SIMS), an energetic beam of focused ions is directed at the sample surface in a high- or ultrahigh-vacuum...
Abstract
This article focuses on the principles and applications of high-sputter-rate dynamic secondary ion mass spectroscopy (SIMS) for depth profiling and bulk impurity analysis. It begins with an overview of various factors pertinent to sputtering. This is followed by a discussion on the effects of ion implantation and electronic excitation on the charge of the sputtered species. The design and operation of the various instrumental components of SIMS is then reviewed. Details on a depth-profiling analysis of SIMS, the quantitative analysis of SIMS data, and the static mode of operation of time-of-flight SIMS are covered. Instrumental features required for secondary ion imaging are presented and the differences between quadrupole and high-resolution magnetic mass filters are described. The article also reviews the optimum method for analysis of nonmetallic samples and high detection sensitivity of SIMS. It ends with a discussion on a variety of examples of SIMS applications.
Series: ASM Handbook
Volume: 20
Publisher: ASM International
Published: 01 January 1997
DOI: 10.31399/asm.hb.v20.a0002494
EISBN: 978-1-62708-194-8
... become distorted during drying/fusing cycle Mask areas not to be coated Ion implantation Allow for electrical contact to be made on nonsignificant surfaces or use a conductive screen Avoid features that would shield the surface from the beam (line-of-sight limited) unless multiple beams...
Abstract
This article presents general design principles for different types of surface-finishing processes, such as cleaning, organic coatings, and inorganic coatings applied by a variety of techniques. It discusses the factors that influence the selection of surface-finishing processes. These include fabrication processes, size, weight, functional requirements, and design features. The article discusses the design as an integral part of manufacturing. It contains tables that summarize the design limitations for selected surface-preparation, organic finishing, and inorganic finishing processes.
Series: ASM Handbook Archive
Volume: 10
Publisher: ASM International
Published: 01 January 1986
DOI: 10.31399/asm.hb.v10.a0001770
EISBN: 978-1-62708-178-8
...). Auger electron emission is also caused by energetic ions, such as those used for ion beam sputtering of solid surfaces, in conjunction with most surface analysis techniques. However, ion-induced Auger yields are pronounced only for some elements, for example, aluminum, and generally from 0 to 100 eV...
Abstract
This article describes the principles and applications of Auger electron spectroscopy (AES). It provides information on the instrumentation typically used in the AES, including an electron gun, an electron spectrometer, a secondary electron detector, and an ion gun. The article also describes experimental methods and limitations of the AES, including elemental detection sensitivity, electron beam artifacts, sample charging, spectral peak overlap, high vapor pressure samples, and sputtering artifacts.
Series: ASM Handbook
Volume: 22B
Publisher: ASM International
Published: 01 November 2010
DOI: 10.31399/asm.hb.v22b.a0005504
EISBN: 978-1-62708-197-9
... Abstract This article reviews the characterization methods for producing 3-D microstructural data sets. The methods include serial sectioning by mechanical material removal method and focused ion beam tomography method. The article describes how these data sets are used in realistic 3-D...
Abstract
This article reviews the characterization methods for producing 3-D microstructural data sets. The methods include serial sectioning by mechanical material removal method and focused ion beam tomography method. The article describes how these data sets are used in realistic 3-D simulations of microstructural evolution during materials processing and materials response. It also explains how the 3-D experimental data are actually input and used in the simulations using phase-field modeling and finite-element modeling.
Series: ASM Handbook
Volume: 9
Publisher: ASM International
Published: 01 December 2004
DOI: 10.31399/asm.hb.v09.a0003760
EISBN: 978-1-62708-177-1
... sectioning, focused ion beam tomography, atom probe tomography, and X-ray microtomography. Nine case studies are presented that represent the work of the various research groups currently working on 3D microscopy using serial sectioning and illustrate the variants of the basic experimental techniques...
Abstract
Three-dimensional microscopy can be used to reveal the shape, distribution, and connectivity of three-dimensional (3D) features that lie buried within an opaque material. This article discusses several experimental techniques that can be used to generate 3D images. These include serial sectioning, focused ion beam tomography, atom probe tomography, and X-ray microtomography. Nine case studies are presented that represent the work of the various research groups currently working on 3D microscopy using serial sectioning and illustrate the variants of the basic experimental techniques. The article also discusses the techniques for reconstruction and visualization of 3D microstructures with advanced computer software and hardware.
Book: Surface Engineering
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001288
EISBN: 978-1-62708-170-2
.... Harper J.E. , Ion Beam Sputtering , Thin Film Processes , Vossen J.L. and Kern W. , Ed., Academic Press , 1978 , p 175 – 206 10.1016/B978-0-12-728250-3.50010-6 2. Lee R.E. , Microfabrication by Ion Beam Etching , J. Vac. Sci. Technol. , Vol 16 ( No. 2 ), 1979 , p...
Abstract
Sputtering is a nonthermal vaporization process in which the surface atoms are physically ejected from a surface by momentum transfer from an energetic bombarding species of atomic/molecular size. It uses a glow discharge or an ion beam to generate a flux of ions incident on the target surface. This article provides an overview of the advantages and limitations of sputter deposition. It focuses on the most common sputtering techniques, namely, diode sputtering, radio-frequency sputtering, triode sputtering, magnetron sputtering, and unbalanced magnetron sputtering. The article discusses the fundamentals of plasma formation and the interactions on the target surface. A comparison of reactive and nonreactive sputtering is also provided. The article concludes with a discussion on the several methods of process control and the applications of sputtered films.
Book: Powder Metallurgy
Series: ASM Handbook
Volume: 7
Publisher: ASM International
Published: 30 September 2015
DOI: 10.31399/asm.hb.v07.a0006126
EISBN: 978-1-62708-175-7
.... For high-resolution work, an ultra-fine coating deposit is required. Chromium or gold/palladium sputtered in a special ultra-high-vacuum sputtering system using a macromolecular pump produces fine-grained coatings. Ion beam sputtering produces high-resolution coatings and can deposit multiple material...
Abstract
This article discusses the capabilities and limitations of various material characterization methods that assist in the selection of a proper analytical tool for analyzing particulate materials. Commonly used methods are microanalysis, surface analysis, and bulk analysis. The techniques used for performing microanalysis include scanning electron microscopy and electron probe X-ray microanalysis. The article describes surface analysis techniques, including Auger electron spectroscopy, X-ray photoelectron spectroscopy, and ion-scattering spectroscopy. Bulk analysis techniques, such as X-ray powder diffraction, inductively coupled plasma atomic emission spectroscopy, atomic absorption spectroscopy, and atomic fluorescence spectrometry, are also discussed.
Series: ASM Handbook
Volume: 13A
Publisher: ASM International
Published: 01 January 2003
DOI: 10.31399/asm.hb.v13a.a0003681
EISBN: 978-1-62708-182-5
... Abstract Surface modification is the alteration of the surface composition or structure using energy or particle beams. This article discusses two different surface modification methods. The first, ion implantation, is the introduction of ionized species into the substrate using kilovolt...
Abstract
Surface modification is the alteration of the surface composition or structure using energy or particle beams. This article discusses two different surface modification methods. The first, ion implantation, is the introduction of ionized species into the substrate using kilovolt to megavolt ion accelerating potentials. The second method, laser processing, is high-power laser melting with or without mixing of materials precoated on the substrate, followed by rapid melt quenching. The article also describes the advantages and disadvantages of the surface modification approach to promote corrosion resistance.
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