The gas-tungsten arc welding (GTAW) process is performed using a welding arc between a nonconsumable tungsten-base electrode and the workpieces to be joined. The arc discharge requires a flow of electrons from the cathode through the arc column to the anode. This article discusses two cases of electron discharge at the cathode: thermionic emission and nonthermionic emission, also called cold cathode, or field emission. It schematically illustrates relative heat transfer contributions to workpiece in the GTAW process. The article provides information on the effects of cathode tip shape and shielding gas composition in the GTAW process.

This article discusses the general principles, optical systems, and emission sources of optical emission spectroscopy for elemental analysis. Changes in the energy of the valence or outer shell electrons result in the atomic lines used in emission spectroscopy. Each possible combination of electron configurations produces a spectroscopic term that describes the state of the atom. Atomic emission is analytically useful only to the extent that the emission from one atomic species can be measured and its intensity recorded independent of emission from other sources. Emission sources are often designed to minimize molecular emission. Each of the four types of emission sources; arcs, high-voltage sparks, glow discharges, and flames; has a set of physical characteristics with accompanying analytical assets and liabilities. The article also discusses the applications of each type of emission source.

This article is a comprehensive collection of summary charts that provide data and information that are helpful in considering and selecting applicable processes alternative to the conventional material-removal processes. Process summary charts are provided for electrochemical machining, electrical discharge machining, chemical machining, abrasive jet machining, laser beam machining, electron beam machining, ultrasonic impact grinding, hydrodynamic machining, thermochemical machining, abrasive flow machining, and electrical discharge wire cutting.

This article focuses on different thin-film deposition techniques used to make superconducting films and discusses the properties and advantages of high-critical-temperature and low-critical-temperature materials in a number of applications, including signal processing and analog electronic devices. The article gives a brief introduction on superconducting materials, substrates and buffer layers and discusses the major deposition techniques such as, electron-beam co-evaporation, sputtering from either a composite target or multiple sources and laser ablation. The article also describes the in-situ film growth techniques for producing atomic oxygen by radio frequency excitation or microwave discharge or with ozone.

The electronic microcircuit industry has placed severe demands on metal suppliers to provide metals of the highest reproducible purity attainable as a result of the constant quest for the true values of physical and chemical properties of metals. This article describes the commonly used methods for ultrapurification of metals produced by electrolytic processes, including fractional crystallization, zone refining, vacuum melting, distillation, chemical vapor deposition, and solid state refining techniques. In addition, it describes the trace element analysis and resistance-ratio test methods used to characterize purity. Tables list the values for resistance ratios of zone-refined metals and their corresponding chemical compositions, and provide an example of the detection of impurities to concentrations in the parts per billion range, utilizing a combination of the glow discharge mass spectroscopy method and Leco combustion methods.

The effective integration of aluminum metal-matrix composites (Al-MMCs) into useful structures and devices often requires an understanding of the weldability of Al-MMCs that includes a thorough knowledge on the effects of various interactions between matrix and reinforcement. This article provides a detailed discussion on weldability and the effect of viscosity, chemical reactions, and solidification on weldability. It discusses different welding processes, namely, gas-tungsten arc welding, gas-metal arc welding, laser-beam welding, electron-beam welding, resistance welding, friction welding, transient liquid phase bonding, and capacitor discharge welding.

This article provides the basic physics of the two most widely used arc welding processes: gas tungsten arc welding and gas metal arc welding. It describes the various control parameters of these processes such as arc length control, voltage control, heat input control, and metal-transfer control.

This article is a detailed account of optical emission spectroscopy (OES) for elemental analysis. It begins with a discussion on the historical background of OES and development trends in OES methods. This is followed by a description of the general principles and optical systems of OES, along with various types of emission sources commonly used for OES. Some of the processes involved in calibration and quantification of OES for direct solids analysis by the ratio method are then described. The article ends with a discussion on the applications of each type of emission sources.

Sputtering is a nonthermal vaporization process in which the surface atoms are physically ejected from a surface by momentum transfer from an energetic bombarding species of atomic/molecular size. It uses a glow discharge or an ion beam to generate a flux of ions incident on the target surface. This article provides an overview of the advantages and limitations of sputter deposition. It focuses on the most common sputtering techniques, namely, diode sputtering, radio-frequency sputtering, triode sputtering, magnetron sputtering, and unbalanced magnetron sputtering. The article discusses the fundamentals of plasma formation and the interactions on the target surface. A comparison of reactive and nonreactive sputtering is also provided. The article concludes with a discussion on the several methods of process control and the applications of sputtered films.

The plasma carburizing process is basically a low-pressure carburizing process making use of a high-voltage electrical field applied between the load to be treated and the furnace wall producing activated and ionized gas species responsible for carbon transfer to the workpieces. This article begins with an overview of the theoretical background and the range and limitations of glow-discharge plasma. It describes the plasma carburizing process, which is carried out with methane or propane. Plasma carburizing processes of sinter metals and stainless steels, and the influence of current pulse length on carbon input of low-pressure carburizing process are also described. The article presents the basic requirements and process parameters to be considered in plasma carburizing equipment. It also exemplifies a still-working plasma process in industrial measure.

This article provides a brief account of glow discharge mass spectrometry (GDMS) for direct determination of trace elements in solid samples and for fast depth profiling in a great variety of innovative materials. It begins by describing the general principles of GDMS. This is followed by a discussion on the various components of a GDMS system as well as commercial GDMS instruments. A description of processes involved in specimen preparation and cleaning in GDMS is then presented. Various problems pertinent to multielemental calibrations in GDMS are discussed along with measures to overcome them. The article further provides information on the processes involved in the analytical setup of parameters in GDMS, covering the steps involved in the analysis of GDMS data. It ends with a section on the application and interpretation of GDMS in the metals industry.

This article describes the characteristics of continuous cathodic arc sources and filtering process for removing macroparticles from a cathodic arc. It provides information on the types of arc sources and the properties of deposited materials. The advantages, limitations, and applications of arc deposition are also discussed.

Plasma (ion) nitriding is a method of surface hardening using glow-discharge technology to introduce nascent (elemental) nitrogen to the surface of a metal part for subsequent diffusion into the material. This article describes the procedures and applications of plasma nitriding methods of steel. These methods include direct-current plasma nitriding, pulsed-current plasma nitriding, and active-screen plasma nitriding. The article reviews cold-walled and hot-walled furnaces used for plasma nitriding. It provides information on the importance of controlling three process parameters: atmosphere, pressure, and part temperature. The article includes a discussion on the influence of nitrogen concentration on case structure formation on nitrided steel, and explains the significance of microstructure, hardness, and fatigue strength on nitrided case. It also discusses processing, laboratory studies, and applications of nitrocarburizing of steel.

The electrical discharge machining (EDM) process is used for machining dies because of its ability to machining difficult geometries or materials with poor machinability. This article provides a discussion on the fundamentals of electrical discharge erosion and the principles of EDM and orbital-movement EDM. It discusses various aspects of wire EDM in machining dies and provides an overview of the materials used in EDM electrodes. The article concludes with a discussion on electrochemical machining.

This article discusses the various categories of nontraditional machining processes that are subdivided according to the form of energy being harnessed. These include mechanical, electrical, thermal, and chemical methods.