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Nitrogen concentration-depth profiles of nitrided Fe-7wt%Cr alloy and Fe-20...
Available to PurchasePublished: 01 August 2013
Fig. 25 Nitrogen concentration-depth profiles of nitrided Fe-7wt%Cr alloy and Fe-20wt%Cr alloy specimens nitrided for 7 and 15 h, respectively, at 580 °C (853 K) with r N = 0.1 atm −1/2 . The experimental data (points in the figure) were obtained by electron probe microanalysis. The full
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Nitrogen concentration-depth profiles of nitrided Fe-2wt%V alloy specimens ...
Available to PurchasePublished: 01 August 2013
Fig. 27 Nitrogen concentration-depth profiles of nitrided Fe-2wt%V alloy specimens nitrided at r N = 0.103 atm −1/2 . The experimental data (points in the figure) were obtained by electron probe microanalysis. The full lines through the data are the results of fits of the model described
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Glow discharge optical emission spectroscopy concentration depth profiles. ...
Available to PurchasePublished: 01 June 2016
Fig. 8 Glow discharge optical emission spectroscopy concentration depth profiles. (a) Aluminum alloy 360.0 nitrided at 470 °C (880 °F); t N,eff = 5 h. (b) Aluminum alloy 5083 nitrided at 470 °C (880 °F); t N,eff = 4 h
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Hardness depth profiles of electron beam alloyed (EBA) surface layer (iron ...
Available to PurchasePublished: 01 June 2016
Fig. 9 Hardness depth profiles of electron beam alloyed (EBA) surface layer (iron addition) before and after plasma nitriding. Aluminum alloy 5083; T N = 470 °C (880 °F); t N,eff = 5 h
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Published: 01 January 2006
Fig. 4 Comparison of salinity-depth profiles for open ocean sites 2 and 6 (see Fig. 5 for site locations). Source: Ref 5
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Comparison of temperature-depth profiles for open ocean sites 2 and 6 (see ...
Available to PurchasePublished: 01 January 2006
Fig. 7 Comparison of temperature-depth profiles for open ocean sites 2 and 6 (see Fig. 5 for site locations). Source: 5
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Comparison of dissolved oxygen-depth profiles for open ocean stations 2 and...
Available to PurchasePublished: 01 January 2006
Fig. 17 Comparison of dissolved oxygen-depth profiles for open ocean stations 2 and 6 (see Fig. 5 ). Source: Ref 5
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Published: 01 January 2006
Fig. 29 Comparison of pH-depth profiles for open ocean sites 2 and 6 (see Fig. 5 ). Note that the data for the South Pacific are highest at the surface but are intermediate at depths greater than 500 m (1640 ft). Source: Ref 5
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Composition-depth profiles of nitrided stainless steel AISI 316 as determin...
Available to PurchasePublished: 01 October 2014
Fig. 9 Composition-depth profiles of nitrided stainless steel AISI 316 as determined with glow discharge optical emission spectrometry (GDOES). (See also Fig. 7 and Fig. 10 .) Source: Ref 82
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Hardness-depth profiles of nitrided AISI 316. The corresponding micrographs...
Available to PurchasePublished: 01 October 2014
Fig. 10 Hardness-depth profiles of nitrided AISI 316. The corresponding micrographs and composition profiles (determined with glow discharge optical emission spectrometry, GDOES) are shown in Fig. 5 and Fig. 7 , respectively. A profile for carburizing is shown for comparison. Lines
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Hardness-depth profiles after nitriding (solid lines) and nitrocarburizing ...
Available to PurchasePublished: 01 October 2014
Fig. 17 Hardness-depth profiles after nitriding (solid lines) and nitrocarburizing (dash-dot lines) for 16 h of 100 μm strip 7C27Mo2 (molybdenum-modified AISI 420) at the temperatures indicated. Hardness profiles were fitted assuming a sigmoidal function. Source: Ref 86
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Image
Published: 01 January 1986
Fig. 36 Auger depth profiles of three selected locations on the cam lobe shown in Fig. 35(a) . Etch rate was 4 nm/min for the first 4 min and 8 nm/min thereafter. Right-hand profiles are expansions of the vertical axes to give detail on minor elements.
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Published: 01 January 1986
Fig. 10 Depth profiles for the organometallic silicate film shown in Fig. 9 . Note the matrix effects at the film/silicon substrate interface due to the use of an inert argon ion beam. Obtained using raster gating in a scanning ion microprobe
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Negative SIMS depth profiles of oxygen and hydrogen as a function of the la...
Available to PurchasePublished: 01 January 1986
Fig. 16 Negative SIMS depth profiles of oxygen and hydrogen as a function of the laser irradiation of an AISI 202 steel. Obtained using 133 Cs + primary ion bombardment in an ion microscope
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Phosphorus depth profiles for an ion-implanted silicon substrate. (a) Befor...
Available to PurchasePublished: 01 January 1986
Fig. 18 Phosphorus depth profiles for an ion-implanted silicon substrate. (a) Before quantitative analysis of the positive SIMS data. (b) After quantitative analysis. Obtained using 32 O 2 + bombardment in an ion microscope. Obtained using 33 Cs + beam bombardment in an ion
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Published: 01 January 1986
Fig. 19 Negative SIMS depth profiles for LPCDV SiO x N y thin films on silicon. (a)NH 3 /N 2 O = 3 during deposition. (b) NH 3 /N 2 O = 0.33 during depostion. Obtained using 133 Cs + beam bombardment in an ion microscope
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Positive SIMS depth profiles. (a) Various constituents. (b) Hydrogen in a c...
Available to PurchasePublished: 01 January 1986
Fig. 20 Positive SIMS depth profiles. (a) Various constituents. (b) Hydrogen in a calcium-boroaluminosilicate glass ribbon after acid-etching 16 h in H 2 SO 4 . Obtained using Ar + primary ion bombardment in a scanning ion microprobe and an electron beam for charge neutralization
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Positive SIMS depth profiles for alkali-lead-silicate crystal glass. (a) Ha...
Available to PurchasePublished: 01 January 1986
Fig. 21 Positive SIMS depth profiles for alkali-lead-silicate crystal glass. (a) Hazed surface. (b) Cleaned surface. Obtained using 18 O − primary beam bombardment in an ion microscope
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Positive SIMS depth profiles for a lead-silicate glass. (a) Before and (b) ...
Available to PurchasePublished: 01 January 1986
Fig. 22 Positive SIMS depth profiles for a lead-silicate glass. (a) Before and (b) after hydrogen reduction to produce a semiconducting surface layer. Obtained using 32 O 2 + primary beam bombardment and electron beam charge neutralization in an ion microscope
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in X-Ray Diffraction Residual Stress Measurement in Failure Analysis
> Failure Analysis and Prevention
Published: 01 January 2002
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