Skip Nav Destination
Close Modal
Search Results for
chemical-polishing solutions
Update search
Filter
- Title
- Authors
- Author Affiliations
- Full Text
- Abstract
- Keywords
- DOI
- ISBN
- EISBN
- Issue
- ISSN
- EISSN
- Volume
- References
Filter
- Title
- Authors
- Author Affiliations
- Full Text
- Abstract
- Keywords
- DOI
- ISBN
- EISBN
- Issue
- ISSN
- EISSN
- Volume
- References
Filter
- Title
- Authors
- Author Affiliations
- Full Text
- Abstract
- Keywords
- DOI
- ISBN
- EISBN
- Issue
- ISSN
- EISSN
- Volume
- References
Filter
- Title
- Authors
- Author Affiliations
- Full Text
- Abstract
- Keywords
- DOI
- ISBN
- EISBN
- Issue
- ISSN
- EISSN
- Volume
- References
Filter
- Title
- Authors
- Author Affiliations
- Full Text
- Abstract
- Keywords
- DOI
- ISBN
- EISBN
- Issue
- ISSN
- EISSN
- Volume
- References
Filter
- Title
- Authors
- Author Affiliations
- Full Text
- Abstract
- Keywords
- DOI
- ISBN
- EISBN
- Issue
- ISSN
- EISSN
- Volume
- References
NARROW
Format
Topics
Book Series
Date
Availability
1-20 of 789 Search Results for
chemical-polishing solutions
Follow your search
Access your saved searches in your account
Would you like to receive an alert when new items match your search?
1
Sort by
Book Chapter
Series: ASM Handbook
Volume: 9
Publisher: ASM International
Published: 01 December 2004
DOI: 10.31399/asm.hb.v09.a0003764
EISBN: 978-1-62708-177-1
... Abstract This article is a comprehensive collection of tables listing: dangerous reactions of chemicals and designations of etchants; chemical-polishing solutions for irons and steels and nonferrous materials; attack-polishing solutions, macrostructure etchants for iron and steel; and major...
Abstract
This article is a comprehensive collection of tables listing: dangerous reactions of chemicals and designations of etchants; chemical-polishing solutions for irons and steels and nonferrous materials; attack-polishing solutions, macrostructure etchants for iron and steel; and major microstructure etchants for common phases and constituents in ferrous materials.
Series: ASM Handbook
Volume: 9
Publisher: ASM International
Published: 01 December 2004
DOI: 10.31399/asm.hb.v09.a0003777
EISBN: 978-1-62708-177-1
... B 50 mL lactic acid, 30 mL HNO 3 , 2 mL HF 30 mL lactic acid, 10 mL HNO 3 , 10 mL HF Swab specimen 1 to 3 min with solution A, acts as a chemical polishing agent and etchant; then swab 5 s with solution B; repeat if necessary; HF content in solution B controls etch speed Additional etchants...
Abstract
This article describes various procedures used in the metallographic preparation of niobium, tantalum, molybdenum, and tungsten alloys. It provides information on sectioning, grinding, mounting, polishing, and electrolytic etching as well as alternate procedures that have been used on refractory metals. The article presents and analyzes several micrographs, provides etchant formulas for various materials, and discusses the unique characteristics of rhenium and its alloys.
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 19 Differential interference contrast light micrograph showing recrystallized grains and residual chemical banding in a longitudinal section of rolled Ta-10 wt% W. Chemically polished (solution A, Table 2 ) for ∼90 s and etched (solution B, Table 2 ) for ∼60 s. Source: Ref 3
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 8 Differential interference contrast light micrograph of NbCr 2 Laves phase. Chemically polished (solution A, Table 2 ) for ∼30 s and etched (solution C, Table 2 ) for ∼30 s
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 23 Bright-field light micrograph of wrought unalloyed tantalum showing equiaxed grains. Chemically polished (solution A, Table 2 ) for ∼120 s and etched (solution B, Table 2 ) for ∼30 s. Source: Ref 3
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 33 Differential interference contrast light micrograph of tungsten plate showing equiaxed grain structure. Chemically polished (solution A, Table 2 ), swabbed for ∼30 s, and swab etched (solution B, Table 2 ) for ∼40 s
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 2 Differential interference contrast light micrograph of unalloyed niobium showing a typically equiaxed grain structure. Chemically polished (solution A, Table 2 ), swabbed for ∼90 s, and swab etched (solution B, Table 2 ) for ∼90 s
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 16 Differential interference contrast light micrograph showing typical grain structure of wrought unalloyed tantalum. Chemically polished (solution A, Table 2 ), swabbed for ∼120 s, and swab etched (solution B, Table 2 ) for ∼90 s
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 32 Differential interference contrast light micrograph of tungsten plate material showing equiaxed grain structure. Chemically polished (solution A, Table 2 ), swabbed for ∼30 s, and swab etched (solution B, Table 2 ) for ∼40 s
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 21 Differential interference contrast light micrograph of unalloyed tantalum showing deformation structure resulting from Taylor cylinder testing. Chemically polished (solution A, Table 2 ), swabbed for ∼90 s, and etched (solution B, Table 2 ) for ∼20 s
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 22 Differential interference contrast light micrograph of unalloyed tantalum showing shear localization resulting from Taylor cylinder testing. Chemically polished (solution A, Table 2 ), swabbed for ∼90 s, and etched (solution B, Table 2 ) for ∼20 s
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 7 Differential interference contrast light micrograph of high-purity niobium, rolled and annealed (for super-conductive applications), showing bands of unrecrystallized microstructure. Chemically polished (solution A, Table 2 ) for ∼90 s and etched (solution B, Table 2 ) for ∼30 s
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 14 Differential interference contrast light micrograph of Ta-2.5 wt% W wrought bar product showing partially recrystallized microstructure. Chemically polished (solution A, Table 2 ) for ∼90 s and swab etched (solution B, Table 2 ) for ∼30 s
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 15 Differential interference contrast light micrograph of Ta-2.5 wt% W wrought bar product showing a fully recrystallized microstructure. Chemically polished (solution A, Table 2 ) for ∼90 s and swab etched (solution B, Table 2 ) for ∼90 s
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 17 Differential interference contrast light micrograph of wrought Ta-5 wt% W showing a typical equiaxed grain structure. Chemically polished (solution A, Table 2 ), swabbed for ∼120 s, and swab etched (solution B, Table 2 ) for ∼90 s
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 3 Differential interference contrast light micrograph of unalloyed niobium bar stock showing equiaxed grain structure. Chemically polished (solution A, Table 2 ), swabbed for ∼90 s, etched (solution B, Table 2 ), and swabbed for ∼15 s. Source: Ref 2
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 20 Differential interference contrast light micrograph showing deformation structure (longitudinal view) of a Ti-60 wt% Ta tensile specimen. Chemically polished (solution A, Table 2 ), swabbed for ∼90 s, and swab etched (solution B, Table 2 ) for ∼45 to 60 s. Source: Ref 2
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 24 Differential interference contrast light micrograph of as-cast plasma-melted tantalum showing a triple-point structure with Ta 2 O 5 inclusions and TaN needles. Chemically polished (solution A, Table 2 ) for ∼90 s and etched (solution B, Table 2 ) for ∼30 s. Source: Ref 2
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 12 Differential interference contrast light micrograph of arc-melted hafnium-niobium alloy (Hf-2 wt% Nb) buttons showing acicular α within prior-β grains. Chemically polished (solution A, Table 2 ), swabbed for ∼45 s, and swab etched (solution B, Table 2 ) for ∼20 s
More
Image
in Metallography and Microstructures of Refractory Metals and Alloys
> Metallography and Microstructures
Published: 01 December 2004
Fig. 13 Differential interference contrast light micrograph of arc-melted hafnium-niobium alloy (Hf-3 wt% Nb) buttons showing acicular α within prior-β grains. Chemically polished (solution A, Table 2 ), swabbed for 60 to 90 s, and swab etched (solution B, Table 2 ) for ∼20 to 30 s. Source
More
1
