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chemical vapor deposition

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Series: ASM Handbook
Volume: 5B
Publisher: ASM International
Published: 30 September 2015
DOI: 10.31399/asm.hb.v05b.a0006012
EISBN: 978-1-62708-172-6
... carbon nanotubes, silica, metals/metal oxides, ceramics, clays, buckyballs, graphene, polymers, titanium dioxide, and waxes. These can be produced by a variety of methods, including chemical vapor deposition, plasma arcing, electrodeposition, sol-gel synthesis, and ball milling. The application of...
Series: ASM Handbook
Volume: 22A
Publisher: ASM International
Published: 01 December 2009
DOI: 10.31399/asm.hb.v22a.a0005434
EISBN: 978-1-62708-196-2
... describes the modeling of vapor-surface interactions and kinetics of hetereogeneous processes as well as the modeling and kinetics of homogenous reactions in chemical vapor deposition (CVD). The article provides information on the various stages of developing models for numerical simulation of the transport...
Series: ASM Desk Editions
Publisher: ASM International
Published: 01 December 1998
DOI: 10.31399/asm.hb.mhde2.a0003218
EISBN: 978-1-62708-199-3
... Abstract Chemical vapor deposition (CVD) involves the formation of a coating by the reaction of the coating substance with the substrate. Serving as an introduction to CVD, the article provides information on metals, ceramics, and diamond films formed by the CVD process. It further discusses...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001283
EISBN: 978-1-62708-170-2
... Abstract This article presents the principles of chemical vapor deposition (CVD) with illustrations. It discusses the types of CVD processes, namely, thermal CVD, plasma CVD, laser CVD, closed-reactor CVD, chemical vapor infiltration, and metal-organic CVD. The article reviews the CVD reactions...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001284
EISBN: 978-1-62708-170-2
... Abstract This article describes the vapor-phase growth techniques applied to the epitaxial deposition of semiconductor films and discusses the fundamental processes involved in metal-organic chemical vapor deposition (MOCVD). It reviews the thermodynamics that determine the driving force behind...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001285
EISBN: 978-1-62708-170-2
... Abstract This article discusses the application of amorphous and crystalline films through plasma-enhanced chemical vapor deposition (PECVD) from the view point of microelectronic device fabrication. It describes the various types of PECVD reactors and deposition techniques. Plasma enhancement...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001320
EISBN: 978-1-62708-170-2
... information on the applicable methods for surface engineering of cutting tools, namely, chemical vapor deposited (CVD) coatings, physical vapor deposited coatings, plasma-assisted CVD coatings, diamond coatings, and ion implantation. builtup edge carbides ceramics cermets chemical vapor deposited...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001318
EISBN: 978-1-62708-170-2
... edges of the Shuttle Orbiter vehicle. This article details the fundamentals of protecting carbon-carbon composites. It explains various coating deposition techniques: pack cementation, chemical vapor deposition, and slurry coatings. The article discusses typical coating architectures in accordance with...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001286
EISBN: 978-1-62708-170-2
... because the materials are not completely reacted and the high gas pressures necessary for reaction result in gas phase collision and vapor phase nucleation, giving a low-density deposit. Better-quality films are obtained by promoting the chemical reaction by some means, such as activating the reactive gas...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001223
EISBN: 978-1-62708-170-2
... cost of vapor degreasing equipment is not justified Cleaning electrical or electronic assemblies in which the presence of inorganic salt deposits may cause current leakage Virtually all common industrial metals can be cleaned in the commonly used cleaning grade solvents without harm to the...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001290
EISBN: 978-1-62708-170-2
... that the source of vapor and the source of energetic ions are separated into two distinct hardware items, as opposed to plasma-based techniques, such as direct current (DC), radio frequency (RF), and magnetron sputtering; plasma-enhanced chemical vapor deposition; and certain forms of ion plating in...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001287
EISBN: 978-1-62708-170-2
... Abstract This article discusses the fundamentals of thermal vaporization and condensation and provides information on the various vaporization sources and methods of vacuum deposition. It offers an overview of reactive evaporation and its deposition techniques. The article also explains the...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001324
EISBN: 978-1-62708-170-2
... Abstract The chemicals that have been used in traditional vapor degreasing have serious health and environmental hazards that have prompted the search for modified and alternative techniques. This article provides a detailed discussion on the regulatory mandates that affect the use of...
Book Chapter

By S.L. Rohde
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001288
EISBN: 978-1-62708-170-2
... with growing concern over process safety and environmentally hazardous wastes, sputter deposition processes are becoming increasingly attractive. Hence, the CrN sputter deposition process is an excellent candidate to replace traditional electroplating or chemical vapor deposition processes, at least in...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001291
EISBN: 978-1-62708-170-2
... refractory metals, such as chemical vapor deposition. All types of vacuum arc deposition processes share the same potential for making commercially valuable coatings. However, cold cathode sources produce macroparticles that may need to be removed in certain applications. Although hot sources avoid the...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001294
EISBN: 978-1-62708-170-2
... well as multisource techniques such as molecular beam epitaxy and chemical vapor deposition. In spite of the equivalent film properties of these techniques, PLD remains one of the preferred deposition techniques because of its minimal vacuum system requirements, high average deposition rate, and ease...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001311
EISBN: 978-1-62708-170-2
... oxidation resistance through the use of polishing, buffing, and wire brushing operations. The article also covers a wide range of surface modification and coating processes, including ion implantation, diffusion, chemical and physical vapor deposition, plating, anodizing, and chemical conversion coatings as...
Book Chapter

By Donald M. Mattox
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001289
EISBN: 978-1-62708-170-2
..., the film ions are thermalized in the plasma, but both the film ions and the gas ions are accelerated to the substrate under an applied bias. Gaseous chemical vapor precursor species containing the material to be deposited can be used as a deposition source. Using a chemical vapor precursor...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001300
EISBN: 978-1-62708-170-2
...-Williamson plots for titanium nitride coatings produced by several deposition technologies. The broadening is dominated by strain, because the intercept is close to zero, implying a grain size greater than 1 μm (40 μin.). Fig. 9 Hall-Williamson plots for physical and chemical vapor deposited titanium...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001304
EISBN: 978-1-62708-170-2
..., hot-dip coating processes, electrogalvanizing, electroplating, metal cladding, organic coatings, zinc-rich coatings, porcelain enameling, thermal spraying, hardfacing, vapor-deposited coatings, surface modification, and surface hardening via heat treatment. alloy steel cadmium plating carbon...