This article is a detailed account of optical emission spectroscopy (OES) for elemental analysis. It begins with a discussion on the historical background of OES and development trends in OES methods. This is followed by a description of the general principles and optical systems of OES, along with various types of emission sources commonly used for OES. Some of the processes involved in calibration and quantification of OES for direct solids analysis by the ratio method are then described. The article ends with a discussion on the applications of each type of emission sources.

The overall chemical composition of metals and alloys is most commonly determined by X-ray fluorescence (XRF) and optical emission spectroscopy (OES), and combustion and inert gas fusion analysis. This article provides information on the capabilities, uses, detection threshold and precision methods, and sample requirements. The amount of material that needs to be sampled, operating principles, and limitations of the stated methods are also discussed.

This article discusses the general principles, optical systems, and emission sources of optical emission spectroscopy for elemental analysis. Changes in the energy of the valence or outer shell electrons result in the atomic lines used in emission spectroscopy. Each possible combination of electron configurations produces a spectroscopic term that describes the state of the atom. Atomic emission is analytically useful only to the extent that the emission from one atomic species can be measured and its intensity recorded independent of emission from other sources. Emission sources are often designed to minimize molecular emission. Each of the four types of emission sources; arcs, high-voltage sparks, glow discharges, and flames; has a set of physical characteristics with accompanying analytical assets and liabilities. The article also discusses the applications of each type of emission source.