Metallographic contrasting methods include various electrochemical, optical, and physical etching techniques, which in turn are enhanced by the formation of a thin transparent film on the specimen surface. This article primarily discusses etching in conjunction with light microscopy and describes several methods for film formation, namely, heat tinting, color etching, anodizing, potentiostatic etching, vapor deposition, and film deposition by sputtering. It provides information on the general procedures and precautions for etchants and reagents used in metallographic microetching, macroetching, electropolishing, chemical polishing, and other similar operations.

This article describes various procedures used in the metallographic preparation of niobium, tantalum, molybdenum, and tungsten alloys. It provides information on sectioning, grinding, mounting, polishing, and electrolytic etching as well as alternate procedures that have been used on refractory metals. The article presents and analyzes several micrographs, provides etchant formulas for various materials, and discusses the unique characteristics of rhenium and its alloys.