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Hugh O. Pierson
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Chemical vapor infiltration
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Book: Composites
Series: ASM Handbook
Volume: 21
Publisher: ASM International
Published: 01 January 2001
DOI: 10.31399/asm.hb.v21.a0003372
EISBN: 978-1-62708-195-5
Abstract
This article focuses on the process methods and matrix chemistries of ceramic-matrix composites. These methods include pressure-assisted densification, chemical vapor infiltration, melt infiltration, polymer infiltration and pyrolysis, and sol-gel processing. The article discusses the use of a ceramic, preceramic, or metal phase as a fluid or vapor phase reactant to form the matrix. Emphasis is placed on microstructural features that influence ultimate composite properties.
Book: Composites
Series: ASM Handbook
Volume: 21
Publisher: ASM International
Published: 01 January 2001
DOI: 10.31399/asm.hb.v21.a0003373
EISBN: 978-1-62708-195-5
Abstract
This article describes the various pure forms of carbon matrices and the corresponding methods used to create them or incorporate them into a matrix of a composite. These forms include graphite, diamond, fullerenes, and nanotubes. The article discusses the three types of liquid precursors, namely, thermoplastic, thermosetting, and evaporative or solvent carriers. It provides a description of the advantages and limitations of various methods involved in chemical vapor infiltration. The article concludes with a discussion on matrix contribution to composite properties.
Book Chapter
Processing of Carbon-Carbon Composites
Available to PurchaseBook: Composites
Series: ASM Handbook
Volume: 21
Publisher: ASM International
Published: 01 January 2001
DOI: 10.31399/asm.hb.v21.a0003422
EISBN: 978-1-62708-195-5
Abstract
This article describes the manufacture, post-processing, fabrication, and properties of carbon-carbon composites (CCCs). Manufacturing techniques with respect to the processibility of different geometries of two-directional and multiaxial carbon fibers are listed in a table. The article discusses matrix precursor impregnants, liquid impregnation, and chemical vapor infiltration (CVI) for densification of CCCs. It presents various coating approaches for protecting CCCs, including pack cementation, chemical vapor deposition, and slurry coating. Practical limitations of coatings are also discussed. The article concludes with information on the mechanical properties of CCCs.
Book Chapter
Chemical Vapor Deposition of Nonsemiconductor Materials
Available to PurchaseBook: Surface Engineering
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001283
EISBN: 978-1-62708-170-2
Abstract
This article presents the principles of chemical vapor deposition (CVD) with illustrations. It discusses the types of CVD processes, namely, thermal CVD, plasma CVD, laser CVD, closed-reactor CVD, chemical vapor infiltration, and metal-organic CVD. The article reviews the CVD reactions of materials related to hard, tribological, and high-temperature coatings and to free-standing structures. It concludes by reviewing the advantages, disadvantages, and applications of CVD.