Chemical Vapor Deposition and Related Processes
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Published:1998
Abstract
Chemical vapor deposition (CVD) involves the formation of a coating by the reaction of the coating substance with the substrate. Serving as an introduction to CVD, the article provides information on metals, ceramics, and diamond films formed by the CVD process. It further discusses the characteristics of different pack cementation processes, including aluminizing, siliconizing, chromizing, boronizing, and multicomponent coating.
Chemical Vapor Deposition and Related Processes, Metals Handbook Desk Edition, 2nd ed., Edited By Joseph R. Davis, ASM International, 1998, p 1166–1167, https://doi.org/10.31399/asm.hb.mhde2.a0003218
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