Kinetics of Gaseous Corrosion Processes
-
Published:2003
Abstract
This article describes the Schottky defect and the Frenkel defect in oxides. It provides information on the p-type metal-deficit oxides and n-type semiconductor oxides. The article discusses diffusion mechanisms and laws of diffusion proposed by Fick. It explains the oxide texture of amorphous and epitaxy oxide layers and presents equations for various oxidation reaction rates. The article reviews different theories to describe the oxidation mechanism. These include the Cabrera-Mott, Hauffe-IIschner, Grimley-Trapnell, Uhlig, and Wagner theories.
Marek Danielewski, Kinetics of Gaseous Corrosion Processes, Corrosion: Fundamentals, Testing, and Protection, Vol 13A, ASM Handbook, Edited By Stephen D. Cramer, Bernard S. Covino, Jr., ASM International, 2003, p 97–105, https://doi.org/10.31399/asm.hb.v13a.a0003589
Download citation file:
Join ASM International
Being a member of the world’s largest association of materials professionals provides the benefits and resources you need to accomplish your personal and professional goals.
