Chemical Vapor Deposition of Nonsemiconductor Materials Available to Purchase
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Published:1994
Abstract
This article presents the principles of chemical vapor deposition (CVD) with illustrations. It discusses the types of CVD processes, namely, thermal CVD, plasma CVD, laser CVD, closed-reactor CVD, chemical vapor infiltration, and metal-organic CVD. The article reviews the CVD reactions of materials related to hard, tribological, and high-temperature coatings and to free-standing structures. It concludes by reviewing the advantages, disadvantages, and applications of CVD.
Hugh O. Pierson, Chemical Vapor Deposition of Nonsemiconductor Materials, Surface Engineering, Vol 5, ASM Handbook, Edited By C.M. Cotell, J.A. Sprague, F.A. Smidt, Jr., ASM International, 1994, p 510–516, https://doi.org/10.31399/asm.hb.v05.a0001283
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