Thin-Film Materials
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Published:1990
Abstract
This article focuses on different thin-film deposition techniques used to make superconducting films and discusses the properties and advantages of high-critical-temperature and low-critical-temperature materials in a number of applications, including signal processing and analog electronic devices. The article gives a brief introduction on superconducting materials, substrates and buffer layers and discusses the major deposition techniques such as, electron-beam co-evaporation, sputtering from either a composite target or multiple sources and laser ablation. The article also describes the in-situ film growth techniques for producing atomic oxygen by radio frequency excitation or microwave discharge or with ozone.
Kenneth E. Kihlstrom, Thin-Film Materials, Properties and Selection: Nonferrous Alloys and Special-Purpose Materials, Vol 2, ASM Handbook, By ASM Handbook Committee, ASM International, 1990, p 1081–1084, https://doi.org/10.31399/asm.hb.v02.a0001113
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