Fundamentals of Modeling for Metals Processing
This article focuses on transport phenomena and modeling approaches that are specific to vapor-phase processes (VPP). It discusses the VPP for the synthesis of materials. The article reviews the basic notions of molecular collisions and gas flows, and presents transport equations. It describes the modeling of vapor-surface interactions and kinetics of hetereogeneous processes as well as the modeling and kinetics of homogenous reactions in chemical vapor deposition (CVD). The article provides information on the various stages of developing models for numerical simulation of the transport phenomena in continuous media and transition regime flows of VPP. It explains the methods used for molecular modeling in computational materials science. The article also presents examples that illustrate multiscale simulations of CVD or PVD processes and examples that focus on sputtering deposition and reactive or ion beam etching.
Alain Dollet, Modeling of Vapor-Phase Processes, Fundamentals of Modeling for Metals Processing, Vol 22A, ASM Handbook, Edited By D.U. Furrer, S.L. Semiatin, ASM International, 2009, p 75–105, https://doi.org/10.31399/asm.hb.v22a.a0005434
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