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Abstract

Pulsed-current plating can be defined simply as metal deposition by pulsed electrolysis, which involves using interrupted direct current to electroplate parts. This article discusses the advantages and limitations of pulsed-current plating and provides information on the process principles and control, solution composition, operating conditions, and necessary equipment modifications.

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Chuck VanHorn, 1994. "Pulsed-Current Plating", Surface Engineering, C.M. Cotell, J.A. Sprague, F.A. Smidt, Jr.

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