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Abstract

Measuring the thickness of thin films can be accomplished in many ways. This article focuses on the optical method of single-wavelength ellipsometry, two multiple-wavelength methods of reflectometry and spectroscopic ellipsometry for measuring the thickness of thin films. The general capabilities, principles and applications of ellipsometry and reflectometry are discussed in terms of nondestructive methods.

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Harland G. Tompkins, Film Thickness Measurements Using Optical Techniques, Surface Engineering, Vol 5, ASM Handbook, Edited By C.M. Cotell, J.A. Sprague, F.A. Smidt, Jr., ASM International, 1994, p 629–634, https://doi.org/10.31399/asm.hb.v05.a0001295

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