Ion implantation involves the bombardment of a solid material with medium-to-high-energy ionized atoms and offers the ability to alloy virtually any elemental species into the near-surface region of any substrate. This article describes the fundamentals of the ion implantation process and discusses the advantages, limitations, and applications of ion implantation. It also reviews a typical medium current semiconductor implanter adapted for implantation of metals with the aid of illustrations.
ASM Reference Publications Catalog
The new Fall / Winter 2019-2020 Catalog features more than 200 new and upcoming releases and our popular best-selling titles. Save now with prepublication pricing and set sales.