Pulsed-current plating can be defined simply as metal deposition by pulsed electrolysis, which involves using interrupted direct current to electroplate parts. This article discusses the advantages and limitations of pulsed-current plating and provides information on the process principles and control, solution composition, operating conditions, and necessary equipment modifications.
Chuck VanHorn, Pulsed-Current Plating, Surface Engineering, Vol 5, ASM Handbook, Edited By C.M. Cotell, J.A. Sprague, F.A. Smidt, Jr., ASM International, 1994, p 282–284, https://doi.org/10.31399/asm.hb.v05.a0001262
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