This article discusses the current state of large area integrated circuit deprocessing, the latest achievements in the development of automated deprocessing equipment, and the potential impact of advancements in gas-assisted etching, ion source alternatives, compact spectroscopy, and high-speed lasers.

automated IC deprocessing, large area delayering, plasma FIB, SEM imaging, spectroscopy
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Copyright © ASM International® 2019
2019
ASM International
Topics
Specimen preparation Milling Semiconductor wafer fabrication Secondary ion mass spectrometry Scanning electron microscopes
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