Skip to Main Content
ASM Handbook

Corrosion: Fundamentals, Testing, and Protection

Edited by
Stephen D. Cramer
Stephen D. Cramer
Search for other works by this author on:
Bernard S. Covino, Jr.
Bernard S. Covino, Jr.
Search for other works by this author on:
ASM International
Volume
13A
ISBN electronic:
978-1-62708-182-5
Publication date:
2003
Book Chapter

Chemical-Mechanical Planarization for Semiconductors

By
Anne E. Miller
Anne E. Miller
Intel Corporation
Search for other works by this author on:
Paul B. Fischer
Paul B. Fischer
Intel Corporation
Search for other works by this author on:
Allen D. Feller
Allen D. Feller
Intel Corporation
Search for other works by this author on:
Tatyana N. Andryushchenko
Tatyana N. Andryushchenko
Intel Corporation
Search for other works by this author on:
Kenneth C. Cadien
Kenneth C. Cadien
Intel Corporation
Search for other works by this author on:
Published:
2003
Page range:
164 - 169
Publication history
December 01, 2003

Abstract

Chemical-mechanical planarization (CMP) of metals is described as mechanically accelerated corrosion, erosion corrosion, or metallic corrosion enhanced by wear. This article reviews the history, process, chemistry, electrochemistry, and defect issues for CMP. It provides an overview of CMP through a schematic illustration of CMP process equipment. The applications of CMP to tungsten and copper alloys are of prime interest in the semiconductor industry. The article discusses copper CMP and tungsten CMP in detail and analyzes polishing mechanism during CMP by application of direct current potentiodynamic polarization and alternating current impedance measurements. It concludes with information on chemically induced defects such as pitting corrosion, galvanic corrosion, and chemical etching.

You do not currently have access to this content.
Don't already have an account? Register

Anne E. Miller, Paul B. Fischer, Allen D. Feller, Tatyana N. Andryushchenko, Kenneth C. Cadien, 2003. "Chemical-Mechanical Planarization for Semiconductors", Corrosion: Fundamentals, Testing, and Protection, Stephen D. Cramer, Bernard S. Covino, Jr.

Download citation file:


×
Close Modal
This Feature Is Available To Subscribers Only

Sign In or Create an Account

Close Modal
Close Modal