This guide outlines recent advances in the various methods of laser technology and appropriate manufacturing applications. Each process has unique requirements and matching the laser source to the project is essential for developing a robust solution.

The utility of cluster ion beams for x-ray photoelectron spectroscopy (XPS) analysis is just beginning to be explored, making a range of materials accessible that previously could not be analyzed. When combined with a monatomic source, these cluster ion beams will become an essential tool for any materials analysis laboratory. A new monatomic and gas cluster ion source for XPS instruments uses argon gas cluster sputtering to clean surfaces and create depth profiles for a growing class of advanced materials that include both hardened inorganic and softer organic materials.