New thermal spray methods optimized for the production of functional coatings are bridging the gap between traditional thermal spraying and thin-film deposition technologies. Two such methods, one known alternately as very low pressure plasma spraying (VLPPS) or plasma spray-physical vapor deposition (PS-PVD) and one called thin-film thermal spray chemical vapor deposition (CVD), are briefly reviewed here.

This content is only available as a PDF.
You do not currently have access to this content.